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A study of thermally-induced optical bistability and the role of surface treatments in Si-based mid-infrared photonic crystal cavities

机译:研究了热致光学双稳态和表面的作用   在si基中红外光子晶体腔中处理

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摘要

We report the observation of optical bistability in Si-based photonic crystalcavities operating around 4.5 \mum. Time domain measurements indicate that thesource of this optical bistability is thermal, with a time constant on theorder of 5 \mus. Quality (Q) factor improvement is shown by the use of surfacetreatments (wet processes and annealing), resulting in an increase of Q-factorfrom 11,500 to 29,300 at 4.48 \mum. After annealing in a N2 environment,optical bistability is no longer seen in our cavities.
机译:我们报告了在4.5μm左右运行的Si基光子晶体腔中的光学双稳性的观察结果。时域测量表明,这种光学双稳态的来源是热的,其时间常数约为5μs。通过使用表面处理(湿法工艺和退火处理)可以显示质量(Q)因子的改善,从而使Q因子在4.48μm时从11,500增加到29,300。在氮气环境中退火后,在我们的型腔中不再看到光学双稳态。

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